Deena Starkel holds both a B.S. and M.S. in Environmental Engineering from the University of Idaho. She is a licensed Professional Environmental Engineer with over 20 years of experience in the semiconductor industry, specializing as a Facilities Chemical, Water, and Wastewater Engineer at Micron Technology.

Currently, Deena serves as a Facilities Member of Technical Staff (MTS) Water Engineer at Micron’s Technology Development (TD) facility and corporate headquarters in Boise, ID. Her primary responsibilities include system design, process engineering, and operations support for incoming water, ultrapure water, reclaim/reuse, and wastewater treatment for Micron’s newest ID1 Fab under construction in Idaho. She has also led process engineering efforts during the design and construction of several new Micron TD Fabs and Central Utility Plants in Boise.

Deena actively supports the site Water Sustainability team, helping to identify and implement water sustainability projects at the Boise site to align with Micron’s corporate sustainability goals and roadmap. She works on the site water model and long-term planning to secure water and wastewater resources and infrastructure for the site's future development and expansion.

Since 2018, Deena has been an active member of the UPW IRDS group and contributed to the development of the SEMI F98 Standard - Guide for Treatment of Reuse Water in Semiconductor Processing. She participates in the IRDS Water & Energy and ESSF Teams, as well as the SEMI Water Management Workgroup, collaborating to develop a water management strategies and roadmap for water and energy sustainability in the semiconductor industry.